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Characteristics and the Model of Resistive Random Access Memory Switching of the Ti/TiO 2 Resistive Material Depending on the Thickness of Ti

โœ Scribed by Kim, Sook Joo; Sung, Min Gyu; Joo, Moon Sig; Kim, Wan Gee; Kim, Ja Yong; Yoo, Jong Hee; Kim, Jung Nam; Gyun, Byun Ggu; Byun, Jun Young; Roh, Jae Sung; Park, Sung Ki; Kim, Yong Soo


Book ID
120382433
Publisher
Institute of Pure and Applied Physics
Year
2011
Tongue
English
Weight
726 KB
Volume
50
Category
Article
ISSN
0021-4922

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The resistive switching characteristics
โœ Kou-Chen Liu; Wen-Hsien Tzeng; Kow-Ming Chang; Yi-Chun Chan; Chun-Chih Kuo; Chun ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 613 KB

We successfully fabricated the Gd 2 O 3 film for the application of resistive random access memory (RRAM). The resistive switching behavior of the Ti/Gd 2 O 3 /Pt capacitor structure could be both operated under positive or negative bias. However, there was a significant difference on the switching