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Channeling effect for low energy ion implantation in Si

✍ Scribed by K. Cho; W.R. Allen; T.G. Finstad; W.K. Chu; J. Liu; J.J. Wortman


Book ID
113277270
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
680 KB
Volume
7-8
Category
Article
ISSN
0168-583X

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