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Big channeling effects at low-energy ion implantation in silicon

✍ Scribed by Bollmann, J. ;Klose, H. ;Mertens, A.

Publisher: John Wiley and Sons
Year: 1986
Tongue: English
Weight: 199 KB
Volume: 97
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2210970247

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