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Layer splitting in Si by H+He ion co-implantation: Channeling effect limitation at low energy

✍ Scribed by C Qian; B Terreault; S.C Gujrathi


Book ID
114164486
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
271 KB
Volume
175-177
Category
Article
ISSN
0168-583X

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