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Buried, ordered structures: Boron in Si(111) and Si(100)

✍ Scribed by R.L. Headrick; B.E. Weir; A.F.J. Levi; D.J. Eaglesham; L.C. Feldman


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
422 KB
Volume
111
Category
Article
ISSN
0022-0248

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Etching processing of Si(111) and Si(100
✍ Masanori Nakamura; Moon-Bong Song; Masatoki Ito πŸ“‚ Article πŸ“… 1996 πŸ› Elsevier Science 🌐 English βš– 512 KB

situ real-time measurements of etching processes by infrared total reflection spectroscopy were carried out for the first time on Si(ll1) and Si(100) surfaces in ammonium fluoride solution. The absorption bands became broad by the interaction between terminal hydrides with water molecules. On Si(lll