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Boron diffusion and activation in SOI and bulk Si: The role of the buried interface

✍ Scribed by Maria Aboy; Lourdes Pelaz; J. Montserrat; F.J. Bermúdez; J.J. Hamilton

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
218 KB
Volume
257
Category
Article
ISSN
0168-583X

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