Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ

✍ Scribed by J.J. Hamilton; E.J.H. Collart; B. Colombeau; M. Bersani; D. Giubertoni; J.A. Sharp; N.E.B. Cowern; K.J. Kirkby

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 190 KB
• Volume: 124-125
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2005.08.055