In this article, the results obtained on 5lms deposited by the metalorganic chemical vapor deposition (MOCVD) method using monomethylhydrazine (CH 3 N 2 H 3 , MMH) as a nitrogen source are described. A general atmospheric CVD apparatus with a fused quartz reaction tube and an external heating furnac
β¦ LIBER β¦
Boron nitride films prepared by RF sputtering
β Scribed by Yasuda, K. ;Yoshida, A. ;Takeda, M. ;Masuda, H. ;Akasaki, I.
- Publisher
- John Wiley and Sons
- Year
- 1985
- Tongue
- English
- Weight
- 163 KB
- Volume
- 90
- Category
- Article
- ISSN
- 0031-8965
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