✦ LIBER ✦

Boron electrical activation in dual B++ N++ and B++ Ar+ion-implanted silicon

✍ Scribed by V. B. Odzhaev,V. N. Popok,V. S. Prosolovich,V. Hnatowicz

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Depth Distribution of Boron and Radiatio

✍ Odzhaev, V. B. ;Popok, V. N. ;Červená, J. ;Hnatowicz, V. ;Kvítek, J. ;Vacík, J. 📂 Article 📅 1995 🏛 John Wiley and Sons 🌐 English ⚖ 345 KB

Defects formation in the dual B+and N+io

✍ V. Popok; V. Odzhaev; V. Hnatowicz; J. Kvítek; V. Švorčik; V. Rybka 📂 Article 📅 1994 🏛 Springer 🌐 English ⚖ 365 KB

Redistribution of implanted impurities i

✍ Katsuhiro Yokota; Takafumi Nakamura; Takaei Kitagawa; Fumiyoshi Miyashita; Kiyot 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 377 KB

Determination of boron range distributio

✍ Á. Z. Nagy; J. Bogáncs; J. Gyulai; A. Csőke; V. Nazarov; Z. Seres; A. Szabo; Yu. 📂 Article 📅 1977 🏛 Springer 🌐 English ⚖ 726 KB

Electrical activation of ultra-shallow B

✍ Woo Sik Yoo; Kitaek Kang 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 413 KB

The gettering of boron by an ion-implant

✍ Richard B. Fair; Paul N. Pappas 📂 Article 📅 1975 🏛 Elsevier Science 🌐 English ⚖ 268 KB