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Depth Distribution of Boron and Radiation Defects in Silicon Dual Implanted with B+ and N+ Ions

✍ Scribed by Odzhaev, V. B. ;Popok, V. N. ;Červená, J. ;Hnatowicz, V. ;Kvítek, J. ;Vacík, J.

No coin nor oath required. For personal study only.

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