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Band offsets of atomic layer deposited Al2O3 and HfO2 on Si measured by linear and nonlinear internal photoemission

✍ Scribed by M. Lei; J. H. Yum; S. K. Banerjee; G. Bersuker; M. C. Downer

Book ID: 112181132
Publisher: John Wiley and Sons
Year: 2012
Tongue: English
Weight: 596 KB
Volume: 249
Category: Article
ISSN: 0370-1972
DOI: 10.1002/pssb.201100744

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