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Atomic scale simulation of silicon anisotropic chemical etching

✍ Scribed by H. Camon; M. Djafari-Rouhani; D. Estève; A. M. Gué; Z. Moktadir

Publisher: Springer-Verlag
Year: 1995
Tongue: English
Weight: 514 KB
Volume: 1
Category: Article
ISSN: 0946-7076
DOI: 10.1007/bf01371489

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