Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons

✍ Scribed by Kääriäinen T., Cameron D., Kääriäinen M.-L., Sherman A.

Tongue: English
Leaves: 265
Category: Library

No coin nor oath required. For personal study only.

✦ Synopsis

2nd Edition. — Wiley, 2013. — 265 p.

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

✦ Subjects

Специальные дисциплины;Наноматериалы и нанотехнологии;Технологии получения наноматериалов и наноструктур

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