Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications, Second Edition

✍ Scribed by Tommi Kaariainen, David Cameron, Marja?Leena Kaariainen, Arthur Sherman(auth.)

• Year: 2013
• Tongue: English
• Leaves: 264
• Category: Library

✦ Synopsis

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.Content:
Chapter 1 Fundamentals of Atomic Layer Deposition (pages 1–31):
Chapter 2 Elemental Semiconductor Epitaxial Films (pages 33–49):
Chapter 3 III?V Semiconductor Films (pages 51–66):
Chapter 4 Oxide films (pages 67–159):
Chapter 5 Nitrides and Other Compounds (pages 161–182):
Chapter 6 Metals (pages 183–206):
Chapter 7 Organic and Hybrid Materials (pages 207–213):
Chapter 8 ALD Applications and Industry (pages 215–242):