Atomic layer deposition in energy conversion applications

✍ Scribed by Julien Bachmann

Publisher: Wiley VCH
Year: 2017
Tongue: English
Leaves: 295
Edition: 1
Category: Library

No coin nor oath required. For personal study only.

✦ Synopsis

Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry

✦ Table of Contents

Content: Introduction to Atomic Layer Deposition. Basics of Atomic Layer Deposition: Growth Characteristics and Conformality / Jolien Dendooven, Christophe Detavernier --
Atomic Layer Deposition in Photovoltaic Devices. Atomic Layer Deposition for High-Efficiency Crystalline Silicon Solar Cells / Bart Macco, Bas W H Loo, Wilhelmus M M Kessels --
ALD for Light Absorption / Alex Martinson --
Atomic Layer Deposition for Surface and Interface Engineering in Nanostructured Photovoltaic Devices / Carlos Guerra-Nuñez, Hyung Gyu Park, Ivo Utke --
ALD toward Electrochemical Energy Storage. Atomic Layer Deposition of Electrocatalysts for Use in Fuel Cells and Electrolyzers / Lifeng Liu --
Atomic Layer Deposition for Thin-Film Lithium-Ion Batteries / Ola Nilsen, Knut B Gandrud, Ruud Amund, Fjellvåg Helmer --
ALD-Processed Oxides for High-Temperature Fuel Cells / Michel Cassir, Arturo Meléndez-Ceballos, Marie-Hélène Chavanne, Dorra Dallel, Armelle Ringuedé --
ALD in Photoelectrochemical and Thermoelectric Energy Conversion.ALD for Photoelectrochemical Water Splitting / Lionel Santinacci --
Atomic Layer Deposition of Thermoelectric Materials / Maarit Karppinen, Antti J Karttunen.

✦ Subjects

Atomic layer deposition.;TECHNOLOGY & ENGINEERING / Mechanical

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