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Atomic Layer Deposition of Y 2 O 3 Thin Films from Yttrium Tris( N , N ‘-diisopropylacetamidinate) and Water

✍ Scribed by de Rouffignac, Philippe; Park, Jin-Seong; Gordon, Roy G.

Book ID
124078618
Publisher
American Chemical Society
Year
2005
Tongue
English
Weight
265 KB
Volume
17
Category
Article
ISSN
0897-4756

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✍ Ritala, Mikko; Kalsi, Pia; Riihelä, Diana; Kukli, Kaupo; Leskelä, Markku; Jokine 📂 Article 📅 1999 🏛 American Chemical Society 🌐 English ⚖ 85 KB

TaN, Ta 3 N 5 , and TaO x N y films were deposited by the atomic layer deposition technique. The alternate surface reactions between TaCl 5 and NH 3 resulted in Ta 3 N 5 films, but when elemental zinc, serving as an additional reducing agent, was supplied on the substrates between the TaCl 5 and NH