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ATOMIC LAYER DEPOSITION OF SiO 2 USING CATALYZED AND UNCATALYZED SELF-LIMITING SURFACE REACTIONS

โœ Scribed by KLAUS, J. W.; SNEH, O.; OTT, A. W.; GEORGE, S. M.


Book ID
120293941
Publisher
World Scientific Publishing Company
Year
1999
Tongue
English
Weight
727 KB
Volume
06
Category
Article
ISSN
0218-625X

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Atomic layer deposition of Al2O3 and SiO
โœ J.D Ferguson; A.W Weimer; S.M George ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 764 KB

Al O and SiO were deposited on BN particles with atomic layer control using alternating exposures of Al CH rH O 2 3 2 3 3 2 and SiCl rH O, respectively. The sequential surface chemistry was monitored in vacuum using transmission Fourier 4 2 ลฝ . transform infrared FTIR spectroscopy studies on high su