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Atomic layer deposition of SiO2 at room temperature using NH3-catalyzed sequential surface reactions

✍ Scribed by J.W. Klaus; S.M. George

Book ID: 117220235
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 334 KB
Volume: 447
Category: Article
ISSN: 0039-6028
DOI: 10.1016/s0039-6028(99)01119-x

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