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Atomic Layer Deposition of SiO 2 Films on BN Particles Using Sequential Surface Reactions

โœ Scribed by Ferguson, J. D.; Weimer, A. W.; George, S. M.


Book ID
120292861
Publisher
American Chemical Society
Year
2000
Tongue
English
Weight
357 KB
Volume
12
Category
Article
ISSN
0897-4756

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๐Ÿ“œ SIMILAR VOLUMES


Atomic layer deposition of Al2O3 and SiO
โœ J.D Ferguson; A.W Weimer; S.M George ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 764 KB

Al O and SiO were deposited on BN particles with atomic layer control using alternating exposures of Al CH rH O 2 3 2 3 3 2 and SiCl rH O, respectively. The sequential surface chemistry was monitored in vacuum using transmission Fourier 4 2 ลฝ . transform infrared FTIR spectroscopy studies on high su