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Atomic layer controlled growth of Si3N4 films using sequential surface reactions

✍ Scribed by J.W Klaus; A.W Ott; A.C Dillon; S.M George

Book ID: 117218933
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 227 KB
Volume: 418
Category: Article
ISSN: 0039-6028
DOI: 10.1016/s0039-6028(98)00705-5

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