𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Atomic layer deposition of hafnium and zirconium silicate thin films

✍ Scribed by E. Vainonen-Ahlgren; E. Tois; T. Ahlgren; L. Khriachtchev; J. Marles; S. Haukka; M. Tuominen

Book ID
117626838
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
142 KB
Volume
27
Category
Article
ISSN
0927-0256

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Atomic Layer Deposition of Hafnium Dioxi
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water
✍ K. Kukli; M. Ritala; M. LeskelΓ€; T. Sajavaara; J. Keinonen; A.C. Jones; N.L. Tob πŸ“‚ Article πŸ“… 2004 πŸ› John Wiley and Sons 🌐 English βš– 272 KB πŸ‘ 1 views

## Abstract HfO~2~ films were grown by atomic layer deposition (ALD) from a new liquid precursor, Hf(ONEt~2~)~4~ and H~2~O, at temperatures between 250 °C and 350 °C on borosilicate glass and Si(100) substrates. The highest growth rate was achieved at 300 °C, whereas the growth was essentially slow