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Atomic-layer-deposited (HfO 2 ) 1− x (Al 2 O 3 ) x nanolaminate films on InP with different Al 2 O 3 contents

✍ Scribed by An, Chee-Hong; Mahata, Chandreswar; Byun, Young-Chul; Kim, Hyoungsub

Book ID: 120977584
Publisher: Institute of Physics
Year: 2013
Tongue: English
Weight: 1024 KB
Volume: 46
Category: Article
ISSN: 0022-3727
DOI: 10.1088/0022-3727/46/27/275301

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