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MOCVD and Physicochemical Characterization of (HfO2)x(Al2O3)1-x Thin Films

✍ Scribed by Tamara P. Smirnova; Mikhail S. Lebedev; Natalia B. Morozova; Peter P. Semyannikov; Ksenia V. Zherikova; Vasily V. Kaichev; Yurii V. Dubinin


Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
490 KB
Volume
16
Category
Article
ISSN
0948-1907

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