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Atomic force microscopy study of the degradation mechanism of ultrathin HfO2layers on silicon during vacuum annealing

✍ Scribed by A. S. Baturin; A. V. Zenkevich; Yu. Yu. Lebedinskii; N. Yu. Lyubovin; V. N. Nevolin; E. P. Sheshin

No coin nor oath required. For personal study only.

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