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Atomic diffusion and interface reaction of Cu/Si (111) films prepared by ionized cluster beam deposition

โœ Scribed by Cao, Bo; Yang, Tongrui; Li, Gongping; Cho, Seongjin; Kim, Hee


Book ID
123194845
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
542 KB
Volume
89
Category
Article
ISSN
0042-207X

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