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Al- and Cu-doped films on Si(111) substrate by molecular beam epitaxy and evaluation of depth profiles of Al and Cu atoms

โœ Scribed by M. Ajmal Khan; M. Takeishi; Y. Matsumoto; T. Saito; T. Suemasu


Publisher
Elsevier
Year
2011
Tongue
English
Weight
307 KB
Volume
11
Category
Article
ISSN
1875-3892

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