Molecular beam epitaxy of - films on Si(111) substrates and its influence on minority-carrier diffusion length of Si measured by EBIC

✍ Scribed by H. Kawakami; M. Suzuno; K. Akutsu; J. Chen; Y. Fuxing; T. Sekiguchi; T. Suemasu

• Publisher: Elsevier
• Year: 2011
• Tongue: English
• Weight: 401 KB
• Volume: 11
• Category: Article
• ISSN: 1875-3892
• DOI: 10.1016/j.phpro.2011.01.029