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Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process

✍ Scribed by Riccardo A. Siliprandi; Stefano Zanini; Elisa Grimoldi; Francesco S. Fumagalli; Ruggero Barni; Claudia Riccardi

No coin nor oath required. For personal study only.

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