Atmospheric Pressure MOCVD of Thin Fe Films on Carbon Fibers
โ Scribed by J.-H. Luo; R.-Y. Luo; W.-G. Zhang
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 610 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0948-1907
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๐ SIMILAR VOLUMES
Bi~2~O~3~ films have been deposited on alumina particles by Fluidized Bed Chemical Vapor Deposition at atmospheric pressure, using bismuth triphenyl and oxygen as precursors. In the operating range tested, the presence of Bi on the whole particles has been evidenced by EDX, and the existence of the
Atmospheric pressure (AP) CVD of TiSe 2 films on glass substrates was achieved by reaction of di-tert-butylselenide and diethyl diselenide with TiCl 4 at 250-600 ยฐC. All the films showed a TiSe 2 Raman pattern with bands at 133 cm -1 and 198 cm -1 . X-ray diffraction (XRD) showed that the TiSe 2 fil