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Fluidized-Bed MOCVD of Bi2O3 Thin Films from Bismuth Triphenyl under Atmospheric Pressure

✍ Scribed by Nicolas Reuge; Jeannette Dexpert-Ghys; Brigitte Caussat

Publisher: John Wiley and Sons
Year: 2010
Tongue: English
Weight: 387 KB
Volume: 16
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200904280

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✦ Synopsis

Bi~2~O~3~ films have been deposited on alumina particles by Fluidized Bed Chemical Vapor Deposition at atmospheric pressure, using bismuth triphenyl and oxygen as precursors. In the operating range tested, the presence of Bi on the whole particles has been evidenced by EDX, and the existence of the α and γ phases of Bi~2~O~3~ has been revealed consistently by Raman spectroscopy and by XRD.

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