Fluidized-Bed MOCVD of Bi2O3 Thin Films
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Nicolas Reuge; Jeannette Dexpert-Ghys; Brigitte Caussat
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Article
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2010
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John Wiley and Sons
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English
⚖ 387 KB
Bi~2~O~3~ films have been deposited on alumina particles by Fluidized Bed Chemical Vapor Deposition at atmospheric pressure, using bismuth triphenyl and oxygen as precursors. In the operating range tested, the presence of Bi on the whole particles has been evidenced by EDX, and the existence of the