𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Synthesis of Pyrite (FeS2) Thin Films by Low-Pressure MOCVD

✍ Scribed by B. Meester; L. Reijnen; A. Goossens; J. Schoonman

Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
696 KB
Volume
6
Category
Article
ISSN
0948-1907

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Fluidized-Bed MOCVD of Bi2O3 Thin Films
Fluidized-Bed MOCVD of Bi2O3 Thin Films from Bismuth Triphenyl under Atmospheric Pressure
✍ Nicolas Reuge; Jeannette Dexpert-Ghys; Brigitte Caussat πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 387 KB πŸ‘ 1 views

Bi~2~O~3~ films have been deposited on alumina particles by Fluidized Bed Chemical Vapor Deposition at atmospheric pressure, using bismuth triphenyl and oxygen as precursors. In the operating range tested, the presence of Bi on the whole particles has been evidenced by EDX, and the existence of the

Surface Quality of Epitaxial CeO2 Thin F
Surface Quality of Epitaxial CeO2 Thin Films Grown on Sapphire by Aerosol MOCVD
✍ Karol FrΓΆhlich; Jan Ε ouc; Daniel MachajdΓ­k; Matej Jergel; Johan Snauwaert; Louis πŸ“‚ Article πŸ“… 1998 πŸ› John Wiley and Sons 🌐 English βš– 382 KB πŸ‘ 2 views

Laue oscillations) appear close to the high-angle reflections. The film thickness can then be evaluated as: where W i and W i-1 are positions of adjacent satellite maxima.

Correlation Between the Electrical Prope
Correlation Between the Electrical Properties and the Morphology of Low-Pressure MOCVD Titanium Oxynitride Thin Films Grown at Various Temperatures
✍ F. Fabreguette; L. Imhoff; M. Maglione; B. Domenichini; M. C. Marco de Lucas; P. πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 616 KB

Titanium oxynitride (TiN x O y ) thin films were deposited by low-pressure metalΒ±organic CVD (LP-MOCVD) on (100) silicon, sapphire, and polycrystalline alumina substrates. Titanium isopropoxide (TIP) and ammonia were used as precursors. The influence of the growth temperature, ranking from 450 C to