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Atmospheric pressure chemical vapour deposition of VO2 and VO2/TiO2 films from the reaction of VOCl3, TiCl4 and water

✍ Scribed by Qureshi, Uzma; Manning, Troy D.; Parkin, Ivan P.

Book ID
121429787
Publisher
Royal Society of Chemistry
Year
2004
Tongue
English
Weight
159 KB
Volume
14
Category
Article
ISSN
0959-9428

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Atmospheric pressure chemical vapour deposition of WO3 thin films from a volatile fluorinated tungsten oxo-alkoxide precursor, W(O)(OCH2CF3)4
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## Abstract The monomeric tungsten oxo‐fluoroalkoxide W(O)(CH~2~CF~3~)~4~ (1) was synthesized from W(O)Cl~4~ and CF~3~CH~2~OH in the presence of ammonia. It was used in atmospheric pressure chemical vapour deposition experiments to deposit non‐stoichiometric WO~2.9~ when used as a single‐source pre