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Assumptions in Thin Film Residual Stress Methods

โœ Scribed by Vermeulen, Arnold C.


Book ID
120977181
Publisher
Trans Tech Publications, Ltd.
Year
2002
Tongue
English
Weight
406 KB
Volume
404-407
Category
Article
ISSN
1662-9752

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Nanoparticulate origin of intrinsic resi
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The formation of grains in thin films generates intrinsic residual stress. In this work, we present a model of intrinsic residual stress calculation based on the size-dependent phase transitions of the nanograins. Evaporated thin films are produced by condensation from the vapor on the substrate. It