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Application of total reflection X-ray fluorescence in semiconductor surface analysis

✍ Scribed by V. Penka; W. Hub

Book ID
118252164
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
641 KB
Volume
44
Category
Article
ISSN
0584-8547

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Ah&act--This work shows the feasibility of surface analysis though the detection of characteristic fluorescent radiation in the total-reflection regime. A theoretical formalism to correlate surface parameters with X-ray Buorescence intensities from multiple-layer samples was developed. Experimental