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Surface analysis for Si-wafers using total reflection X-ray fluorescence analysis

✍ Scribed by W. Berneike; J. Knoth; H. Schwenke; U. Weisbrod

Book ID
112376619
Publisher
Springer
Year
1989
Tongue
English
Weight
251 KB
Volume
333
Category
Article
ISSN
1618-2650

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Ah&act--This work shows the feasibility of surface analysis though the detection of characteristic fluorescent radiation in the total-reflection regime. A theoretical formalism to correlate surface parameters with X-ray Buorescence intensities from multiple-layer samples was developed. Experimental