Application of Monte Carlo method to the electron probe microanalysis of thin films

✍ Scribed by A. Desalvo; R. Rosa

• Publisher: Elsevier Science
• Year: 1979
• Weight: 410 KB
• Volume: 4
• Category: Article
• ISSN: 0390-6035
• DOI: 10.1016/0390-6035(79)90036-1

✦ Synopsis

In the present paper the basic features of Monte Carlo method as applied to the electron probe microanalysis are outlined. In particular, applications to a large variety of experimental situations are reviewed. The problems examined are as follow: i) a binary film on a substrate of a third element; ii) a ternary film without substrate; iii) a ternary film on a substrate of an element present in the film; iv) a multi-layer elemental film; v) a multi-layer compound film.

The output of the computer program consists of: a) spatial distribution of the penetrating electrons; b) depth distribution of the generated X-rays; c) spatial distribution of the deposited energy; d) spatial distribution of the electron--hole pairs created in semiconductors.

By comparing X-rays intensities with experimental data, one is able to obtain both the unknown composition and the thickness of the film. In some particular instances, additional informations, such as an independent determination of the thickness or measurements of the X-rays intensities at different electron energies, may be required.

BASIS OF MONTE CARLO MODELS

The Monte Carlo method (M.C., for short) consists essentially in * Presented at the IV Scientific Meeting of the Italian Association for Crystal Growth (AICC),