𝔖 Bobbio Scriptorium
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Application of factor analysis to elemental detection limits in sputter depth profiling

✍ Scribed by Stephen W. Gaarenstroom


Book ID
107925580
Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
569 KB
Volume
26
Category
Article
ISSN
0169-4332

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Depth profiles were taken by x-ray photoelectron spectrometry/Ar-ion sputtering from copper sheets oxidized during 30 min in air at 200 or 3OO"C, respectively. The data of the depth profiles were subjected to factor analysis in order to determine the relevant components of the copper oxide layers. F