✦ LIBER ✦

Application of factor analysis in electron spectroscopic depth profiling on copper oxide

✍ Scribed by Henning Bubert; Monika Korte; Rainer P.H. Garten; Erhard Grallath; Marek Wielunski

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 951 KB
Volume: 297
Category: Article
ISSN: 0003-2670
DOI: 10.1016/0003-2670(94)00053-0

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✦ Synopsis

Depth profiles were taken by x-ray photoelectron spectrometry/Ar-ion sputtering from copper sheets oxidized during 30 min in air at 200 or 3OO"C, respectively. The data of the depth profiles were subjected to factor analysis in order to determine the relevant components of the copper oxide layers. Factor analysis shows the existence of a cuprous oxide layer (Cu,O) on both specimens under bombardment with 2 keV argon ions during depth profiling. Rutherford backscattering measurements and carrier gas fusion analysis were successfully applied to determine the oxygen content of the oxide layers. Results corroborate the identification of Cu,O in both layers.

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