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Theoretical analysis of AES depth profiling in multilayers: Application to C/W multilayers

✍ Scribed by J.P. Petrakian; P. Renucci


Publisher
Elsevier Science
Year
1987
Weight
65 KB
Volume
186
Category
Article
ISSN
0167-2584

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## Abstract Sputter‐deposited multilayers of Si and Ta with a nominal period length of a double layer (Ta + Si) of 20 nm were studied with AES depth profiling and with transmission electron microscopy (TEM). The asymmetric shape of the measured Si layer profiles was fitted to model calculations bas