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Analysis of weakly bonded oxygen in HfO2/SiO2/Si stacks by using HRBS and ARXPS

✍ Scribed by Ta-Chang Tien; Li-Chuan Lin; Lurng-Shehng Lee; Chi-Jen Hwang; Siddheswar Maikap; Yuri M. Shulga

No coin nor oath required. For personal study only.

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