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Analysis of the mean crystallite size and microstress in titanium silicide thin films

✍ Scribed by N.I. Morimoto; J.W. Swart; H.G. Riella

Book ID
107925787
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
44 KB
Volume
38
Category
Article
ISSN
0169-4332

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Quantitative AES analysis of TiSi x (1.3 ≀ x ≀ 2.1) thin films deposited on silicon by co-sputtering in a magnetron system has been performed. The time variation of the surface composition during sputtering with Ar Y ions of 3 keV energy has been explained using a kinetic model that allows one to de