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Analysis of thin high-k and silicide films by means of heavy ion time-of-flight forward-scattering spectrometry

✍ Scribed by T. Sajavaara; B. Brijs; S. Giangrandi; K. Arstila; A. Vantomme; W. Vandervorst

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 336 KB
Volume: 249
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2006.04.049

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