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Amorphous-Si1−xSnx:H by sputter assisted plasma CVD

✍ Scribed by H Itozaki; N Fujita; T Igarashi; H Hitotsuyanagi


Book ID
118332429
Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
150 KB
Volume
59-60
Category
Article
ISSN
0022-3093

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✍ S Bhattacharyya; D Kanjilal; A Sayeed; V Meenakshi; SV Subramanyam 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 425 KB

## Amorphous hydrogenated carbon films were prepared by plasma assisted CVD method. Their de conductivity was studied as a function of temperature in the range of 300 K to 10 K. films were then subjected to high energy (170 MeVI ion irradiation. After irradiation a marked change was observed in th