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[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - The prevention of charge damage on thin gate oxide from high density plasma deposition

✍ Scribed by Shih, H.H.; Tsai, C.Y.; Yang, G.S.; Chen, K.C.; Yew, T.R.; Lur, W.; Liou, F.T.

Book ID: 126763845
Publisher: American Vacuum Soc
Year: 1999
Tongue: English
Weight: 252 KB
Edition: 1999
Category: Article
ISBN-13: 9780965157735
DOI: 10.1109/PPID.1999.798820

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