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[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Antenna ratio definition for VLSI circuits [plasma etch damage]

✍ Scribed by Simon, P.; Luchies, J.-M.; Maly, W.

Book ID: 115544747
Publisher: American Vacuum Soc
Year: 1999
Tongue: English
Weight: 335 KB
Edition: 1999
Volume: 0
Category: Article
ISBN-13: 9780965157735
DOI: 10.1109/ppid.1999.798798

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