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AlGaN/GaN high electron mobility transistors with nickel oxide based gates formed by high temperature oxidation

✍ Scribed by Lalinsky, T.; Vanko, G.; Vallo, M.; Dobrocka, E.; Ryger, I.; Vincze, A.


Book ID
118031657
Publisher
American Institute of Physics
Year
2012
Tongue
English
Weight
737 KB
Volume
100
Category
Article
ISSN
0003-6951

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