## Abstract We demonstrate AlGaN/GaN heterojunction bipolar transistors (HBTs) by ammonia molecular beam epitaxy (NH~3~ MBE). The several benefits offered by NH~3~ MBE for the growth of GaN based vertical electronic devices are discussed. To obtain good ohmic contacts to the base layer, devices wer
β¦ LIBER β¦
AlGaN/GaN heterojunction field effect transistors grown by nitrogen plasma assisted molecular beam epitaxy
β Scribed by Micovic, M.; Kurdoghlian, A.; Janke, P.; Hashimoto, P.; Wong, D.W.S.; Moon, J.S.; McCray, L.; Chanh Nguyen
- Book ID
- 114538610
- Publisher
- IEEE
- Year
- 2001
- Tongue
- English
- Weight
- 98 KB
- Volume
- 48
- Category
- Article
- ISSN
- 0018-9383
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