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AlF^3 thin films deposited by reactive magnetron sputtering with Al target

✍ Scribed by Lee, Cheng-Chung; Liao, Bo-Huei; Liu, Ming-Chung

Book ID
115407803
Publisher
Optical Society of America
Year
2007
Tongue
English
Weight
150 KB
Volume
15
Category
Article
ISSN
1094-4087

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Aluminium nitride thin films deposited by DC reactive magnetron sputtering
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AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3Γ—10 -3 ; high transmission occurred between [??] structure