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Al2O3 coating of ZnO nanorods by atomic layer deposition

✍ Scribed by B. Min; J.S. Lee; J.W. Hwang; K.H. Keem; M.I. Kang; K. Cho; M.Y. Sung; S. Kim; M.-S. Lee; S.O. Park; J.T. Moon


Book ID
108341905
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
332 KB
Volume
252
Category
Article
ISSN
0022-0248

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A1203-films deposited by atomic layer epitaxy onto silicon wafers were investigated structurally and electrically. A post-deposition anneal at 900Β°C resulted in a decrease in film thickness of about 10% and an increase in the index of refraction of about 3%. The densification did not significantly i